Abstrakt

The analysis of computer-generated particle-monolayer images, presented in Measurement 241 (2025) 115692, shows that the novel method of monolayer parametrization described in that paper is insensitive to distortions in apparent particle size. In this short communication, we demonstrate on a SEM micrograph published in the literature that this feature is also preserved in the case of real, imperfect microscopic images of sputter-coated particle monolayers. For this purpose, we use the micrograph to make four images at different degrees of distortion in apparent particle size. Least-squares fitting performed for the four images reveals that the differences in the determined particle size and surface coverage are statistically insignificant. One-way ANOVA performed on the four data sets shows that their means are statistically equal. The Pearson correlation coefficients calculated for the six pairs of the four data sets indicate a strong linear relationship between the sets.